AFM observation for the oxygen deficiency effect on the surface morphology of VO2 thin films

Journal of Crystal Growth

Volumn 179, Issue 3-4, 1997, Pages 539-545

  Nagashima, M ^a   Wada, H ^a  

^a JAPAN DEFENSE AGENCY   (Japan)

Author keywords

AFM; Laser ablation; Vanadium oxides

Indexed keywords

ATOMIC FORCE MICROSCOPY; CORRELATION METHODS; HIGH TEMPERATURE EFFECTS; LASER ABLATION; MORPHOLOGY; PRESSURE EFFECTS; SEMICONDUCTING FILMS; SILICA; SURFACE ROUGHNESS; THIN FILMS;

LASER SCANNING MICROSCOPY (LSM);

VANADIUM COMPOUNDS;

EID: 0031210332     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(97)00139-5     Document Type: Article

References (15)

1. F.J. Morin, Phys. Rev. Lett. 3 (1959) 34.
2. M. Nagashima, H. Wada, J. Mater. Res., to be published.
3. J.F. De Natale, P.J. Hood, A.B. Harker, J. Appl. Phys. 66 (1989) 5844.
4. E.E. Chain, J. Vac. Sci. Technol. A 4 (1986) 432.
5. K.D. Rogers, J.A. Coath, M.C. Lovell, J. Appl. Phys. 70 (1991) 1412.
6. D.P. Partlow, S.R. Gurkovich, K.C. Radford, L.J. Denes, J. Appl. Phys. 70 (1991) 443.
7. E. Kusano, J.A. Theil, J. Vac. Sci. Technol. A 7 (1989) 1314.
8. C.H. Griffiths, H.K. Eastwood, J. Appl. Phys. 45 (1974) 2201.
9. F.C. Case, J. Vac. Sci. Technol. A 2 (1984) 1509.
10. C.B. Greenberg, Thin Solid Films 110 (1983) 73.
11. L.A. Ladd, W. Paul, Solid State Commun. 7 (1969) 425.
12. M. Borek, F. Qian, V. Nagabushnam, R.K. Singh, Appl. Phys. Lett. 63 (1993) 3288.
13. D.H. Kim, H.S. Kwok, Appl. Phys. Lett. 65 (1994) 3188.
14. G. Binning, C.F. Quate, C. Gerber, Phys. Rev. Lett. 56 (1986) 930.
15. A. Kinbara, Thin Film Preparation Handbook, Kyoritsu Shuppan, Japan, 1991 (in Japanese).