A comparative study of spin-on and chemical vapor deposited teflon amorphous fluoropolymer thin films

Journal of the Electrochemical Society

Volumn 144, Issue 8, 1997, Pages 2924-2928

  Sharangpani, R ^a,c   Singh, R ^a,b,c  

^a AMRL   (United States)

^b CLEMSON UNIVERSITY   (United States)

^c ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; COPOLYMERS; INTEGRATED CIRCUIT MANUFACTURE; PERMITTIVITY; POLYTETRAFLUOROETHYLENES; THIN FILMS; ULTRAVIOLET RADIATION;

SPIN ON METHOD; ULTRAVIOLET LIGHT ASSISTED RAPID ISOTHERMAL PROCESSING;

PLASTIC FILMS;

EID: 0031209217     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837919     Document Type: Article

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