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Volumn 18, Issue 8, 1997, Pages 382-384

The anomalous behavior of hydrogenated/unhydrogenated polysilicon thin-film transistors under electric stress

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; HYDROGENATION; PASSIVATION; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS;

EID: 0031208839     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.605446     Document Type: Article
Times cited : (14)

References (14)
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  • 3
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    • Rodder, M.1
  • 4
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    • Hack, M.1    Lewis, A.G.2    Wu, I.-W.3
  • 5
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    • I.-W. Wu, W. B. Jackson, T. Y. Huang, A. G. Lewis, and A. Chiang, "Mechanism of device degradation in n- and p-channel polysilicon TFT's by electrical stressing." IEEE Electron Device Lett., vol. 11, p. 167, Mar. 1990.
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    • (1987) IEEE Trans. Electron Devices , vol.ED-34 , pp. 1079
    • Rodder, M.1    Antoniadis, D.A.2
  • 7
    • 33747286932 scopus 로고
    • Correlation of polysilicon thin-film transistor characteristics to defect states via thermal annealing
    • Mar.
    • H. N. Chern, C. L. Lee, and T. F. Lei, "Correlation of polysilicon thin-film transistor characteristics to defect states via thermal annealing," IEEE Trans. Electron Devices, vol. 41, p. 460, Mar. 1994.
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  • 11
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.