Insulating modification in cold deposited films of lead

Journal of Low Temperature Physics

Volumn 108, Issue 3-4, 1997, Pages 305-329

  Landau, I L ^a  

^a KAPITZA INSTITUTE FOR PHYSICAL PROBLEMS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; ELECTRIC CONDUCTIVITY; ELECTRIC INSULATING COATINGS; GLASS; METALLIC FILMS;

ATOMIC MOBILITY; COLD DEPOSITION; GLASS SUBSTRATES; INSULATING MODIFICATION;

LEAD;

EID: 0031208384     PISSN: 00222291     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02398717     Document Type: Article

References (6)

1. E. G. Astrakharchik and A. I. Shal'nikov, Zh. Eksp. Tear. Fiz. 72, 1607 (1977);
2. Sov. Phys. JETP 45, 844 (1977).
3. I. A. Parshin, I. L. Landau, and L. Rinderer, Phys. Rev. B 54, 1308 (1996).
4. A. V. Danilov, S. E. Kubatkin, I. L. Landau, and L. Rinderer, J. Low Temp. Phys. 103, 35 (1996).
5. S. E. Kubatkin and I. L. Landau, Zh. Eksp. i Tear. Fiz. 96, 740 (1989);
6. JETP 69, 420 (1989).