Thermal imaging with near-field microscopy

Review of Scientific Instruments

Volumn 68, Issue 8, 1997, Pages 3096-3098

  Boudreau, B D ^a   Raja, J ^b   Hocken, R J ^b   Patterson, S R ^b   Patten, J ^b  

^a Hutchinson Technology Incorporated   (United States)

^b UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE ELEMENT METHOD; IMAGE PROCESSING; INFRARED DETECTORS; INFRARED RADIATION; LIGHT AMPLIFIERS; MICROSCOPES; OPTICAL MICROSCOPY; OPTICAL SYSTEMS; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; RADIOMETERS; SEMICONDUCTOR LASERS;

INFRARED MICROSCOPE; NEAR FIELD MICROSCOPY; THERMAL EMISSIONS;

INFRARED IMAGING;

EID: 0031208043     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1148248     Document Type: Article

References (7)

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6. B. D. Boudreau, Ph.D. dissertation, Michigan Technological University (in preparation).
7. B. D. Boudreau, T. Clonger, J. Raja, J. Patten, and R. J. Hocken, Proceedings from ASPE 1992 Annual Meeting, 1992 (unpublished), Vol. 6, p. 173.