The effective charge in surface electromigration

Surface Science

Volumn 385, Issue 2-3, 1997, Pages 259-269

  Fu, Elain S ^a   Liu, D J ^a   Johnson, M D ^a   Weeks, J D ^b   Williams, Ellen D ^a,b  

^a University of Maryland   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

Author keywords

Diffusion and migration; Models of non equilibrium phenomena; Scanning tunneling microscopy; Semiconducting surfaces; Silicon; Stepped single crystal surfaces; Surface structure, morphology, roughness, and topography

Indexed keywords

DIFFUSION IN SOLIDS; MORPHOLOGY; PYROLYSIS; SCANNING TUNNELING MICROSCOPY; SINGLE CRYSTALS; SURFACE PHENOMENA; SURFACE ROUGHNESS;

SURFACE ELECTROMIGRATION; SURFACE TOPOGRAPHY;

SEMICONDUCTING SILICON;

EID: 0031198681     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00188-X     Document Type: Article

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