Growth of oxides formed on TiAl and FeAl during high temperature oxidation at low oxygen partial pressures

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 61, Issue 8, 1997, Pages 710-714

  Murata, Yoshinori ^a,b   Shimamura, Yutaka ^a,c   Ishida, Takayuki ^a   Morinaga, Masahiko ^b  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

^c CKD Corporation

Author keywords

FeAl; High temperature; Low pressure; Oxidation; Oxide growth; TiAl

Indexed keywords

ALUMINA; CRYSTAL GROWTH; HIGH TEMPERATURE EFFECTS; IRON ALLOYS; OXIDATION; PRESSURE EFFECTS; TITANIUM ALLOYS;

HIGH TEMPERATURE OXIDATION; OXIDE GROWTH; OXYGEN PARTIAL PRESSURE;

INTERMETALLICS;

EID: 0031198597     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet1952.61.8_710     Document Type: Article

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