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Volumn 93, Issue 1, 1997, Pages 7-13

Power systems for reactive sputtering of insulating films

Author keywords

Dielectric; Dual magnetron; Insulators; Pulsed; PVD; Reactors; Sputtering

Indexed keywords

CATHODES; DIELECTRIC FILMS; ELECTRIC INSULATING COATINGS; ELECTRIC POWER SUPPLIES TO APPARATUS; VAPOR DEPOSITION;

EID: 0031198294     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00032-7     Document Type: Article
Times cited : (19)

References (20)
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  • 3
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  • 4
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    • Reactive high rate DC sputtering of oxides
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  • 5
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    • Advances in arc handling in reactive and other difficult processes
    • R. Scholl, Advances in Arc Handling in Reactive and Other Difficult Processes, Proc. 37th SVC Tech. Conf., (1994) 312.
    • (1994) Proc. 37th SVC Tech. Conf. , pp. 312
    • Scholl, R.1
  • 7
    • 0042370954 scopus 로고
    • New method of arc suppression for reactive-DC magnetron sputtering
    • F.L. Williams, H.D. Nusbaum, B.J. Pond, New method of Arc Suppression for Reactive-DC Magnetron Sputtering, OSA Technical Digest, v23, (1992).
    • (1992) OSA Technical Digest , vol.V23
    • Williams, F.L.1    Nusbaum, H.D.2    Pond, B.J.3
  • 9
    • 85033098933 scopus 로고    scopus 로고
    • Advanced Energy Industries, Inc., SPARC-LE® product snapshot
    • Advanced Energy Industries, Inc., SPARC-LE® product snapshot.
  • 12
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    • Reactively sputtered chrome nitride coatings for wear resistance
    • San Diego, CA, April 24-28
    • M. Graham, K. Legg, P. Rudnik, W. Sproul, Reactively Sputtered Chrome Nitride Coatings for Wear Resistance, paper presented at - ICMCTF, San Diego, CA, April 24-28 1995.
    • (1995) ICMCTF
    • Graham, M.1    Legg, K.2    Rudnik, P.3    Sproul, W.4
  • 13
    • 0026989563 scopus 로고
    • Process improvements for sputtering carbon and other difficult materials using combined AC and DC process power
    • R.A. Scholl, Process Improvements for Sputtering Carbon and other Difficult Materials Using Combined AC and DC Process Power, Proc. 35th SVC Tech. Conf., (1992) 391.
    • (1992) Proc. 35th SVC Tech. Conf. , pp. 391
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  • 14
    • 0041369235 scopus 로고    scopus 로고
    • U.S. Patent 4,046,659, issued Sept. 6, 1977 and assigned to Airco Corp.
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  • 15
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    • A quasi-direct current sputtering technique for deposition of dielectrics at enhanced rates
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  • 17
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    • Influence of the plasma on substrate heating during low-frequency reactive sputtering of AIN
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  • 18
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    • Advances in pulsed magnetron sputtering (PMS process)
    • April
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  • 19
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.