Formation kinetics of MoSi2 and Mo5Si3 by the reactive diffusive siliciding of molybdenum

Journal of the American Ceramic Society

Volumn 80, Issue 7, 1997, Pages 1723-1726

  Hillig, William B ^a,b   Usta, Metin ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b AMERICAN CERAMIC SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; COMPUTER SIMULATION; FILM GROWTH; FINITE ELEMENT METHOD; IMPURITIES; MATHEMATICAL MODELS; MOLYBDENUM; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SILICON; STRAIN;

FORMATION KINETICS; PARABOLIC GROWTH LAW; PARABOLIC RATE CONSTANT; REACTIVE DIFFUSIVE SILICIDING;

MOLYBDENUM COMPOUNDS;

EID: 0031193070     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1997.tb03045.x     Document Type: Article

References (19)

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