-
1
-
-
6144277481
-
Ultra-thin diamond films for x-ray window applications
-
A. Feldman and S. Holly, eds., Proc. SPIE
-
M. G. Peters, J. L. Knowles, M. Breen, and J. McCarthy, “Ultra-thin diamond films for x-ray window applications,” in Diamond Optics II, A. Feldman and S. Holly, eds., Proc. SPIE 1146, 217-224 (1990).
-
(1990)
Diamond Optics II
, vol.1146
, pp. 217-224
-
-
Peters, M.G.1
Knowles, J.L.2
Breen, M.3
McCarthy, J.4
-
2
-
-
50749133233
-
Optical applications of polycrystalline diamond, Diamond Relat
-
P. Koidl and C. P. Klages, “Optical applications of polycrystalline diamond,” Diamond Relat. Mater. 1, 1065-1074 (1992).
-
(1992)
Mater.
, vol.1
, pp. 1065-1074
-
-
Koidl, P.1
Klages, C.P.2
-
3
-
-
19444381800
-
Properties of diamond membranes for x-ray lithography
-
H. Windischmann and G. F. Epps, “Properties of diamond membranes for x-ray lithography,” J. Appl. Phys. 68, 5665-5673 (1991).
-
(1991)
J. Appl. Phys.
, vol.68
, pp. 5665-5673
-
-
Windischmann, H.1
Epps, G.F.2
-
4
-
-
0040636510
-
X-Ray lithography mask based on diamond membranes: Potentiality and realization
-
M. Yoshikawa, M. Murakawa, Y. Tzeng, and W. A. Yarbrough, eds. (MYU, Tokyo
-
M. F. Ravet, A. Gicquel, E. Anger, Z. Z. Wang, Y. Chen, and F. Rousseaux, “X-Ray lithography mask based on diamond membranes: potentiality and realization,” in Second International Conference on the Applications of Diamond Films and Related Materials, M. Yoshikawa, M. Murakawa, Y. Tzeng, and W. A. Yarbrough, eds. (MYU, Tokyo, 1993), pp. 77-84.
-
(1993)
Second International Conference on the Applications of Diamond Films and Related Materials
, pp. 77-84
-
-
Ravet, M.F.1
Gicquel, A.2
Anger, E.3
Wang, Z.Z.4
Chen, Y.5
Rousseaux, F.6
-
5
-
-
85013550317
-
Polycrystalline diamond films for optical applications
-
Y. Tzeng, M. Yoshikawa, M. Murakawa, and A. Feldman, eds. (Elsevier, Amsterdam
-
C. Wild, W. Muller-Sebert, T. Eckermann, and P. Koidl, “Polycrystalline diamond films for optical applications,” in Applications of Diamond and Related Materials, Y. Tzeng, M. Yoshikawa, M. Murakawa, and A. Feldman, eds. (Elsevier, Amsterdam, 1991), pp. 197-205.
-
(1991)
Applications of Diamond and Related Materials
, pp. 197-205
-
-
Wild, C.1
Muller-Sebert, W.2
Eckermann, T.3
Koidl, P.4
-
6
-
-
0026869892
-
Study on the polishing of chemically deposited diamond film
-
H. Tokura, C. F. Yang, and M. Yoshikawa, “Study on the polishing of chemically deposited diamond film,” Thin Solid Films, 212, 49-55 (1993).
-
(1993)
Thin Solid Films
, vol.212
, pp. 49-55
-
-
Tokura, H.1
Yang, C.F.2
Yoshikawa, M.3
-
7
-
-
0027565543
-
Preparation of smooth and nanocrystalline diamond films
-
R. Erz, W. Dotter, K. Jung, and H. Ehrhardt, “Preparation of smooth and nanocrystalline diamond films,” Diamond Relat. Mater. 2, 449-453 (1993).
-
(1993)
Diamond Relat. Mater.
, vol.2
, pp. 449-453
-
-
Erz, R.1
Dotter, W.2
Jung, K.3
Ehrhardt, H.4
-
8
-
-
0012246682
-
A novel technique for diamond film deposition using surface wave discharges, Diamond Relat
-
C. F. M. Borges, M. Moisan, and A. Gicquel, “A novel technique for diamond film deposition using surface wave discharges,” Diamond Relat. Mater. 4, 149-154 (1995).
-
(1995)
Mater.
, vol.4
, pp. 149-154
-
-
Borges, C.F.M.1
Moisan, M.2
Gicquel, A.3
-
9
-
-
0028413477
-
Spectroscopic analysis and chemical kinetics modeling of a diamond deposition plasma reactor
-
A. Gicquel, K. Hassouni, S. Farhat, Y. Breton, C. D. Scott, M. Lefebvre, and M. Pealat, “Spectroscopic analysis and chemical kinetics modeling of a diamond deposition plasma reactor,” Diamond Relat. Mater. 3, 581-586 (1994).
-
(1994)
Diamond Relat. Mater.
, vol.3
, pp. 581-586
-
-
Gicquel, A.1
Hassouni, K.2
Farhat, S.3
Breton, Y.4
Scott, C.D.5
Lefebvre, M.6
Pealat, M.7
-
10
-
-
85010169118
-
Dispositif et procede de depot de diamant par depot chimique en phase vapeur assiste par plasma micro-onde
-
P. Bou, L. Vandenbulcke, A. Quilgars, M. Coulon, and M. Moisan, “Dispositif et procede de depot de diamant par depot chimique en phase vapeur assiste par plasma micro-onde,” French patent 2,678,956 (1993).
-
(1993)
French Patent
, vol.2
, pp. 678-956
-
-
Bou, P.1
Vandenbulcke, L.2
Quilgars, A.3
Coulon, M.4
Moisan, M.5
-
11
-
-
85010092323
-
Dispositif et procede de depot de diamant par depot chimique en phase vapeur assiste par plasma micro-onde
-
July
-
P. Bou, L. Vandenbulcke, A. Quilgars, M. Coulon, and M. Moisan, “Dispositif et procede de depot de diamant par depot chimique en phase vapeur assiste par plasma micro-onde,” European patent application 9,109,552 (July 1992).
-
European Patent Application
, vol.9
, pp. 109-552
-
-
Bou, P.1
Vandenbulcke, L.2
Quilgars, A.3
Coulon, M.4
Moisan, M.5
-
12
-
-
0001250578
-
Very low-roughness diamond film deposition using a surface-wave sustained plasma
-
C. F. M. Borges, V. Trava-Airoldi, E. J. Corat, M. Moisan, S. Schelz, and D. Guay, “Very low-roughness diamond film deposition using a surface-wave sustained plasma,” J. Appl. Phys. 80, 6013-6020 (1996).
-
(1996)
J. Appl. Phys.
, vol.80
, pp. 6013-6020
-
-
Borges, C.F.M.1
Trava-Airoldi, V.2
Corat, E.J.3
Moisan, M.4
Schelz, S.5
Guay, D.6
|