Thermal oxidation of silicon in the ultrathin regime

Solid-State Electronics

Volumn 41, Issue 7, 1997, Pages 929-934

  Massoud, H Z ^a  

^a Duke University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; MATHEMATICAL MODELS; REACTION KINETICS; SEMICONDUCTING SILICON; SILICA; THERMAL EFFECTS; THERMOOXIDATION;

FILM INCUBATION PHASES; SILICON MONOXIDE MOLECULES;

ULTRATHIN FILMS;

EID: 0031192360     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(97)00001-4     Document Type: Article

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