The influence of total pressure in the reactor and carrier gas on the chemical vapor deposition of Al from tri-isobutyl aluminum

Journal of Materials Research

Volumn 12, Issue 7, 1997, Pages 1866-1871

  Suzuki, Takakazu ^a  

^a NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; GRAPHITE FIBERS; HELIUM; ORGANOMETALLICS; PRESSURE EFFECTS; PYROLYSIS; REACTION KINETICS; THERMAL DIFFUSION IN SOLIDS;

AUTO PRESSURE CONTROL (APC) SYSTEMS; TRIISOBUTYL ALUMINUM;

ALUMINUM;

EID: 0031192061     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1997.0256     Document Type: Article

References (17)

1. H. O. Pierson, Thin Solid Films 45, 257 (1977).
2. A. Malazgirt and J. W. Evans, Metall. Trans. 11B, 225 (1980); Ph.D Thesis, University of California, Berkeley, CA (1980).
3. M. J. Cooke, R. A. Heinecke, R. C. Stern, and J. W. C. Maes, Solid State Technol., Dec., 62 (1982).
4. R. A. Levy, M. L. Green, and P. K. Gallagher, in Proc. 9th Int. Conf. on CVD, edited by McD. Robinson, C. H. J. van den Brekel, G. W. Cullen, J. M. Blocher, Jr., and P. Rai-Choudhury (Electrochemical Society, Penington, NJ, 1984), pp. 258-274.
5. F. Schmaderer, G. Wahl, M. Dietrich, and C-H. Dustmann, ibid., pp. 663-672.
6. L. Vandenbulcke, Thin Solid Films 102, 149 (1983).
7. T. Suzuki and H. Umehara, J. Metal Finishing Society of Japan 35, 600 (1984).
8. T. Suzuki and H. Umehara, J. Jpn. Inst. Metals 51, 577 (1987).
9. T. Suzuki and H. Umehara, Proc. Int. Conf. on Chemical Vapor Deposition (1987), pp. 1050-1059.
10. M. Kumazawa, H. Umehara, and T. Suzuki, J. Jpn. Inst. Metals 53, 237 (1989).
11. T. Suzuki, H. Umehara, and H. Hino, J. Mater. Res. 9, 1984 (1994).
12. W. L. Smith and T. Wartik, J. Inorg. Nucl. Chem. 29, 629 (1967).
13. B. E. Bent, R. G. Nuzzo, and L. H. Dubois, J. Am. Chem. Soc. 111, 1634 (1989).
14. S. K. Ghandhi and R. J. Field, J. Cryst. Growth 69, 619 (1984).
15. M. L. Hitchman and K. F. Jensen, Chemical Vapor Deposition (Academic Press, London, 1993), pp. 31-150.
16. L. A. Bromley and C. R. Wilke, Industrial and Engineering Chemistry 43, 1641 (1951).
17. G. B. Stringfellow, Organometallic Vapor-phase Epitaxy, Theory and Practice (Academic Press Inc., New York, 1989), p. 10.