Key influence of the thermal history on process-induced defects in Czochralski silicon wafers

Semiconductor Science and Technology

Volumn 12, Issue 7, 1997, Pages 933-937

  Kissinger, G ^a   Graef, D ^a   Lambert, U ^a   Grabolla, T ^a   Richter, H ^a  

^a IHP   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CRYSTAL DEFECTS; CRYSTAL GROWTH FROM MELT; LIGHT SCATTERING; OXIDATION;

INFRARED LIGHT SCATTERING TOMOGRAPHY; THERMAL HISTORY;

SILICON WAFERS;

EID: 0031191541     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/12/7/001     Document Type: Article

References (16)