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Volumn 384, Issue 1-3, 1997, Pages 276-282
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A comparative study of the thermal stability of the (103) surface of group-III-metal/group-IV-semiconductor systems
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Author keywords
Aluminum; Faceting; Gallium; Germanium; Indium; Low energy electron diffraction; Silicon; Surface reconstruction
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Indexed keywords
ALUMINUM;
AUGER ELECTRON SPECTROSCOPY;
CHEMICAL BONDS;
CRYSTAL ATOMIC STRUCTURE;
CRYSTAL ORIENTATION;
LOW ENERGY ELECTRON DIFFRACTION;
SEMICONDUCTING GALLIUM;
SEMICONDUCTING GERMANIUM;
SEMICONDUCTING INDIUM;
SEMICONDUCTING SILICON;
SURFACE PHENOMENA;
SURFACE STRUCTURE;
SURFACE RECONSTRUCTION;
TENSILE STRESSES;
THERMODYNAMIC STABILITY;
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EID: 0031191461
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/S0039-6028(97)00233-1 Document Type: Article |
Times cited : (16)
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References (17)
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