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Volumn 32, Issue 13, 1997, Pages 3511-3516

Fluorine incorporation in silica glass by MCVD process - A critical study

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); FLUORINE; GLASS MANUFACTURE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOSPHORUS; SILICA; THERMODYNAMIC PROPERTIES;

EID: 0031191289     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1018697422691     Document Type: Article
Times cited : (13)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.