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Thin Solid Films

Volumn 303, Issue 1-2, 1997, Pages 226-231

D.c. diode ion nitriding behavior of titanium and Ti-6Al-4V

(2) Chen, K C a Jaung, G J a

a FENG CHIA UNIVERSITY (Taiwan)

Author keywords

Glow discharge; Metals; Nitrides; Titanium nitride

Indexed keywords

ACTIVATION ENERGY; DIFFUSION IN SOLIDS; GLOW DISCHARGES; HARDNESS; IONIZATION OF SOLIDS; NITRIDING; PRESSURE EFFECTS; RESIDUAL STRESSES; TEXTURES; THERMAL EFFECTS; TITANIUM ALLOYS; TITANIUM NITRIDE;

ION NITRIDING;

METALLIC FILMS;

EID: 0031190718 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00075-8 Document Type: Article

Times cited : (42)

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