Elaboration and study of an elastic hard Si-based coating obtained at room temperature from a far cold remote nitrogen plasma

Thin Solid Films

Volumn 303, Issue 1-2, 1997, Pages 156-166

  Baclez, E ^a   Mutel, B ^a   Dessaux, O ^a   Goudmand, P ^a   Grimblot, J ^b   Gengembre, L ^b  

^a UNIV LILLE   (France)

^b UNITÉ DE CATALYSE ET DE CHIMIE DU SOLIDE   (France)

Author keywords

Elastic properties; Hardness; Plasma processing and deposition; Silicon nitride

Indexed keywords

CHEMICAL BONDS; DEPOSITION; ELASTIC MODULI; ELASTICITY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; POLYVINYL CHLORIDES; SILANES; SILICON NITRIDE; SUBSTRATES; WEAR OF MATERIALS; X RAY PHOTOELECTRON SPECTROSCOPY;

MICROINDENTATION; PLASMA DEPOSITION; SCRATCH TESTS;

CERAMIC COATINGS;

EID: 0031190671     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00059-X     Document Type: Article

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