New process for producing particle-free deionized water

Semiconductor International

Volumn 20, Issue 8, 1997, Pages 191-201

  Mohindra, Raj ^a   Kern, Werner ^b  

^a YieldUP Int   (United States)

^b Werner Kern Associates   (United States)

Author keywords

Electrostatic particle removal; Water purification; Zeta potential

Indexed keywords

ELECTROSTATICS; FILTERS (FOR FLUIDS); PARTICLES (PARTICULATE MATTER); PRESSURE DROP; SILICON WAFERS; WATER FILTRATION;

ELECTROSTATIC PARTICLE FILTERS; WATER PURIFICATION; ZETA POTENTIAL;

MICROELECTRONIC PROCESSING;

EID: 0031190509     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

1. R. Mohindra, A.K. Bhushan, R. Bhushan and S. Puri, Yield-UP International, Apparatus for Delivering Ultra-Low Particle Counts in Semiconductor Manufacturing, US Patent No. 5,542,442, Aug. 6, 1996.
2. W. Kern, The Evolution of Silicon Wafer Cleaning Technology, Journal of the Electrochemical Society 137 (6), (1990), pp. 1887-1892
3. D. Riley and R. Carbonell, Proceedings of the Institute of Environmental Sciences, Annual Technical Meeting, pp. 224-228, New Orleans, La. (1990).
4. D. Tolliver, "Trace Chemical Contamination on Silicon Surfaces," Handbook of Semiconductor Wafer Cleaning Technology, W. Kern, editor; Noyes Publications, Park Ridge, N.J., (1993), p. 69.
5. K. Sawada, Membrane Filtration, Ultraclean Technology Handbook, Volume 1: Ultrapure Water, T. Ohmi, editor; M. Dekker, N.Y. (1993), p. 290.
6. Same as ref. 4, p. 70
7. Same as ref. 5, p. 152
8. M. Balazs, 1993 Pure Water Specifications and Guidelines, Balazs Laboratories, Sunnyvale, California (1993)
9. See also: Ultrapure Water: Friend or Foe?, Solid State Technology 36 (10), (Oct. 1993) pp. 75-81.
10. V.B. Menon and R.P. Donovan, Measurement and Control of Particulate Contaminants, Handbook of Semiconductor Wafer Cleaning Technology, W. Kern, editor; Noyes Publications, Park Ridge, N.J. (1993), pp. 381-383.