Effects of discharge voltage on Ti-O film formation on Ti-6A1-4V alloy by reactive DC sputtering

Thin Solid Films

Volumn 303, Issue 1-2, 1997, Pages 196-199

  Sonoda, Tsutomu ^a   Kato, Makoto ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Biomaterials; Plasma processing and deposition; Sputtering; Titanium oxide

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DENTAL ALLOYS; ELECTRIC DISCHARGES; FILM GROWTH; HARDNESS; PLASMA APPLICATIONS; SPUTTER DEPOSITION; TITANIUM ALLOYS; X RAY DIFFRACTION ANALYSIS;

PLASMA DEPOSITION;

TITANIUM OXIDES;

EID: 0031190032     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00125-9     Document Type: Article

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