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Thin Solid Films

Volumn 304, Issue 1-2, 1997, Pages 45-47

PEELS and EXELFS characterization of diamond films grown by the HF-CVD technique on non-scratched Si substrates

(7) Duarte Moller, A a Contreras, O b Hirata, G A c Avalos Borja, M c Galvan D H c Morales De La Garza, L c Cota Araiza, L c

a UNIVERSIDAD DE SONORA (Mexico)

b CENTRO DE INVESTIGACIÓN CIENTÍFICA Y DE EDUCACIÓN SUPERIOR DE ENSENADA (Mexico)

c UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO (Mexico)

Author keywords

Diamond; Electron energy loss spectroscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; FILM GROWTH; FOURIER TRANSFORMS; TRANSMISSION ELECTRON MICROSCOPY;

EXTENDED ENERGY LOSS FINE STRUCTURE (EXELFS); HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); PARALLEL ELECTRON ENERGY LOSS SPECTROMETRY (PEELS);

DIAMOND FILMS;

EID: 0031187431 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(96)09598-3 Document Type: Article

Times cited : (7)

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