An X-ray diffraction (XRD) study of vapor deposited gold thin films on aluminum nitride (AlN) substrates

Thin Solid Films

Volumn 304, Issue 1-2, 1997, Pages 229-238

  Dutta, I ^b   Munns, C B ^b   Dutta, G ^a,b  

^a CTB MCGRAW HILL   (United States)

^b Naval Postgraduate School ^*  (United States)

Author keywords

Adhesion; Aluminum nitride (AlN) substrate; Defects; Gold film; Strain; Transmission electron microscopy (TEM); X ray line broadening

Indexed keywords

ADHESION; ALUMINUM COMPOUNDS; EVAPORATION; GOLD; NITRIDES; POLYCRYSTALLINE MATERIALS; STACKING FAULTS; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

ALUMINUM NITRIDES; WARREN AVERBACH METHOD; X RAY LINE BROADENING;

METALLIC FILMS;

EID: 0031187405     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00220-4     Document Type: Article

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