Optical system for rapid materials characterization with the transient grating technique: Application to nondestructive evaluation of thin films used in microelectronics

Applied Physics Letters

Volumn 71, Issue 2, 1997, Pages 225-227

  Rogers, John A ^a   Fuchs, Martin ^b   Banet, Matthew J ^b   Hanselman, John B ^b   Logan, Randy ^c   Nelson, Keith A ^c  

^a HARVARD UNIVERSITY   (United States)

^b Active Impulse Systems   (United States)

^c MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; DIFFRACTION GRATINGS; LASER BEAMS; MECHANICAL PROPERTIES; MICROELECTRONICS; MULTILAYERS; NICKEL COMPOUNDS; OPTICAL SYSTEMS; PHYSICAL PROPERTIES; SURFACES;

FILM THICKNESS; NONDESTRUCTIVE EVALUATION;

THIN FILMS;

EID: 0031185518     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119506     Document Type: Review

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