Inductively-coupled-plasma-assisted planar magnetron discharge for enhanced ionization of sputtered atoms

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4568-4571

  Setsuhara, Yuichi ^a   Kamai, Masayoshi ^a   Miyake, Shoji ^a   Musil, Jindrich ^b  

^a OSAKA UNIVERSITY   (Japan)

^b INSTITUTE OF MATHEMATICS   (Czech Republic)

Author keywords

Enhanced ionization; ICP; Magnetron sputtering; Optical emission spectroscopy

Indexed keywords

ALUMINUM; ATOMS; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; IONIZATION OF GASES; LIGHT EMISSION; MAGNETRON SPUTTERING; OPTICAL VARIABLES MEASUREMENT; PLASMA DENSITY;

INDUCTIVELY COUPLED PLASMAS (ICP); PLASMA DISCHARGES;

PLASMA APPLICATIONS;

EID: 0031177263     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4568     Document Type: Article

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