Effects of dilution gases on Si atoms and SiHx+ (x = 0-3) ions in electron cyclotron resonance SiH4 plasmas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4664-4669

  Yamamoto, Yasuo ^a   Suganuma, Shinji ^a   Ito, Masafumi ^a   Hori, Masaru ^a   Goto, Toshio ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Electron cyclotron resonance; Ion; Mass spectrometry; Si; SiH4; Ultraviolet absorption spectroscopy

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; ELECTRON CYCLOTRON RESONANCE; IONS; MASS SPECTROMETRY; PLASMA FLOW; PRESSURE EFFECTS; SILANES; ULTRAVIOLET SPECTROSCOPY;

QUADRUPOLE MASS SPECTROMETRY;

PLASMAS;

EID: 0031176882     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4664     Document Type: Article

References (11)

1. K. Kobayashi, M. Hayama, S. Kawamoto and H. Miki: Jpn. J. Appl. Phys. 26 (1987) 202.
2. T. Watanabe, M. Tanaka, K. Azuma, M. Nakatani, T. Sonobe and T. Shimada: Jpn. J. Appl. Phys. 26 (1987) 1215.
3. M. Kitagawa, K. Setsune, Y. Manabe and T. Hirao: Jpn. J. Appl. Phys. 27 (1988) 2026.
4. K. Akiyama, E. Tanaka, A. Takimoto and M. Watanabe: Jpn. J. Appl. Phys. 27 (1988) 2192.
5. Y. Yamamoto, H. Nomura, T. Tanaka, M. Hiramatsu, M. Hori and T. Goto: Jpn. J. Appl. Phys. 33 (1994) 4320.
6. N. Shida, T. Inoue, H. Kokai, Y. Sakamoto, W. Miyazawa, S. Den and Y. Hayashi: Jpn. J. Appl. Phys. 32 (1993) L1635.
7. M. Sakakibara, M. Hiramatsu and T. Goto: J. Appl. Phys. 69 (1991) 3467.
8. T. Tanaka, M. Hiramatsu, M. Nawata, A. Kono and T. Goto: J. Phys. D 27 (1994) 1660.
9. Y. Yamamoto, M. Hori, T. Goto and M. Hiramatsu: J. Vac. Sci. Technol. A14 (1996) 1999.
10. J. M. S. Henis, G. W. Stewart, M. K. Tripodi and P. P. Gaspar: J. Chem. Phys. 57 (1972) 389.
11. H. Chatham, D. Hils, R. Robertson and A. Gallagher: J. Chem. Phys. 81 (1984) 1770.