Development and characterization of a new compact microwave radical beam source

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4588-4592

  Den, Shoji ^a,b   O'Keeffe, Patrick ^b   Hayashi, Yuzo ^b   Ito, Masafumi ^a   Hori, Masaru ^a   Goto, Toshio ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b Irie Koken Co Ltd   (Japan)

Author keywords

Emission spectroscopy; Microwave plasma; Oxygen radical; Titration

Indexed keywords

CARRIER CONCENTRATION; EMISSION SPECTROSCOPY; FREE RADICALS; NITROGEN OXIDES; OXYGEN; PRESSURE EFFECTS; TITRATION;

MICROWAVE PLASMAS;

PLASMA SOURCES;

EID: 0031176422     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4588     Document Type: Article

References (19)

1. J. Asmussen, R. Fritz, L. Mahoney, G. Fournier and G. Demaggio: Rev. Sci. Instrum. 61 (1989) 282.
2. Z. Sitar, M. J. Paisley, D. K. Smith and R. F. Davis: Rev. Sci. Instrum. 61 (1990) 2407.
3. P. O'Keeffe, S. Komuro, S. Den, T. Morikawa and Y. Aoyagi: Jpn. J. Appl. Phys. 30 (1991) 3164.
4. P. O'Keeffe, C. O'Morain, S. Den, Y. Hayashi, S. Komuro and T. Morikawa: Rev. Sci. Instrum. 61 (1989) 282.
5. M. Ikeda, M. Hori, T. Goto, M. Inayoshi, K. Yamada, M. Hiramatsu and M Nawata: Jpn. J. Appl. Phys. 34 (1995) 2484.
6. M. Ikeda, E. Mizuno, M. Hori, T. Goto, M. Inayoshi, K. Yamada, M. Hiramatsu and M. Nawata: Jpn. J. Appl. Phys. 35 (1996) 4826.
7. V. M. Donnelly, D. L. Flamm, W. C. Dautremont-Smiith and D. J. Werder: J. Appl. Phys. 55 (1984) 242.
8. P. O'Keeffe, S. Komuro, S. Den, T. Morikawa and Y. Aoyagi: Jpn. J. Appl. Phys. 30 (1991) L834.
9. Z. Yu, G. Collins, S. Hattori, D. Sugimoto and M. Saita: Appl. Phys. Lett. 59 (1991) 1194.
10. T. Fuyuki, S. Muanaka and H. Matsunami: private communication.
11. J. Battey and E. Tierney: J. Appl. Phys. 60 (1990) 1336.
12. A. Donnelly, M. P. Hughes, J. Geddes and H. B. Gilbody: Meas. Sci. Technol. 3 (1992) 528.
13. L. S. Yu-Jahnes, W. T. Brogan, A. C. Anderson and M. J. Cima: Rev. Sci. Instrum. 63 (1992) 4149.
14. R. E. Walkup, K. L. Saenger and G. S. Selwyn: J. Chem. Phys. 84 (1986) 2668.
15. G. Hancok and M. J. Toogood: Appl. Phys. Lett. 60 (1992) 35.
16. S. Kimura, E. Murakami, K. Miyake, T. Warabisaka, H. Sunami and T. Tokunuma: J. Electrochem. Soc. 132 (1985) 1460.
17. T. T. Chau and K. C. Kao: J. Vac. Sci. Technol. B 14 (1996) 527.
18. Y. Hatanaka and S. Wickramnayaka: J. Jpn. Soc. Appl. Phys. 35 (1992) 894.
19. A. Brockhaus, Y. Yuan, St. Behle and J. Engemann: J. Vac. Sci. Technol. A 14 (1996) 1882.