Loss processes of N2(A3Σu+) by harmful gases

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4744-4746

  Suzuki, Susumu ^a   Itoh, Haruo ^a   Sekizawa, Hisashi ^a   Ikuta, Nobuaki ^a  

^a CHIBA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

CCl2F2; CH2FCF3; N2(A3 u+); NO; Quenching rate coefficient

Indexed keywords

BINARY MIXTURES; ELECTRIC DISCHARGES; FLUORINE COMPOUNDS; MATHEMATICAL MODELS; NITROGEN; NITROGEN COMPOUNDS;

QUENCHING RATE COEFFICIENTS; TOWNSEND DISCHARGES;

MOLECULAR PHYSICS;

EID: 0031176054     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4744     Document Type: Article

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