Dynamic variation of the sticking coefficient of oxygen atoms in helicon-wave excited high-density oxygen plasmas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4747-4751

  Matsushita, Jun ^a,b   Sasaki, Koichi ^a   Kadota, Kiyoshi ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b Makino Corporation   (Japan)

Author keywords

Helicon wave plasma source; Lifetime; Oxygen atoms; Particle flux; Sticking coefficient; Surface coverage; Two photon laser induced fluorescence

Indexed keywords

ATOMIC PHYSICS; ATOMS; FLUORESCENCE; GLOW DISCHARGES; LASER BEAM EFFECTS; OXYGEN; PHOTONS; PLASMA DENSITY; PLASMA SOURCES; PRESSURE EFFECTS;

LASER INDUCED FLUORESCENCE (LIF); PLASMA SURFACE INTERACTIONS; STICKING COEFFICIENTS;

WAVE PLASMA INTERACTIONS;

EID: 0031176026     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4747     Document Type: Article

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