Relationship between control of reactive plasmas with magnetic filter and formation of thin films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4593-4596

  Fukumasa, Osamu ^a   Tauchi, Yasushi ^a   Sakiyama, Satoshi ^a  

^a YAMAGUCHI UNIVERSITY   (Japan)

Author keywords

Electron energy distribution function; Magnetic filter; Multi cusp plasma source; Plasma CVD; Reactive plasmas; Spatial control

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIFFUSION IN GASES; ELECTRONS; FILM GROWTH; FILM PREPARATION; MAGNETIC FILTERS; PLASMA DENSITY; PLASMA SOURCES; SUBSTRATES; THIN FILMS;

ELECTRON ENERGY DISTRIBUTION FUNCTION; PLASMA CHEMICAL VAPOR DEPOSITION;

PLASMA APPLICATIONS;

EID: 0031175979     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4593     Document Type: Article

References (8)

1. O. Fukumasa, H. Naitou and S. Sakiyama: Jpn. J. Appl. Phys. 30 (1991) L1063.
2. O. Fukumasa, H. Naitou and S. Sakiyama: Trans. IEE Jpn. 111-A (1991) 1057.
3. O. Fukumasa, H. Naitou and S. Sakiyama: J. Appl. Phys. 74 (1993) 848.
4. A. J. T. Holmes: Rev. Sci. Instrum. 53 (1982) 1517.
5. K. Kato, S. Iizuka and N. Sato: Appl. Phys. Lett. 65 (1994) 816.
6. See for example Proc. 7th Int. Symp. on the Production and Neutralization of Negative Ions and Beams (Brookhaven, 1995) (AIP Conf. Proc. 380).
7. O. Fukumasa: Shinku 38 (1995) 903 [in Japanese].
8. O. Fukumasa: J. Appl. Phys. 71 (1992) 3193.