Initial study on heat-treatment behavior of ion-beam epitaxial cerium oxides/Si

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

Volumn 18, Issue 7, 1997, Pages 538-543

  Huang, Dading ^a   Wang, Junjie ^a   Yang, Xizhen ^a   Wu, Zhenglong ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EPITAXIAL GROWTH; ION BEAMS; SEMICONDUCTING FILMS; SEMICONDUCTOR MATERIALS;

HEAT TREATMENT BEHAVIORS; ION BEAM EPITAXIAL; SEMICONDUCTING CERIUM OXIDES;

CERIUM COMPOUNDS;

EID: 0031175597     PISSN: 02534177     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)