Effect of the addition of thioacetal on the kinetics of the discharge and crystallization stages of copper electrodeposition

Ukrainskij Khimicheskij Zhurnal

Volumn , Issue 7-8, 1997, Pages 103-108

  Zhitnik, V P ^a   Burov, L M ^a   Govorova, E M ^a   Loshkarev, Yu M ^a  

^a OLES HONCHAR DNIPRO NATIONAL UNIVERSITY   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CRYSTAL GROWTH; CRYSTALLIZATION; REACTION KINETICS; SULFUR COMPOUNDS; VOLTAGE MEASUREMENT;

POTENTIOSTATIC MEASUREMENTS; THIOACETALS;

ELECTRODEPOSITION;

EID: 0031173579     PISSN: 00416045     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)