EUV lithography

Solid State Technology

Volumn 40, Issue 7, 1997, Pages 151-159

  Hawryluk, Andrew M ^a,b,c   Ceglio, Natale M ^a,b,c,d,e,f   Markle, David A ^a,g  

^a Ultratech Stepper Inc   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d Och Spine at New York Presbyterian Hospitals   (United States)

^e Lab's Prog Giant M

^f Lab's Prog Extreme Ultraviolet L

^g PERKINELMER INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0031173538     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (26)

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