A dose look at laser marking of silicon wafers

Solid State Technology

Volumn 40, Issue 7, 1997, Pages 245-251

  Scaroni, Jim ^a,c   McKee, Terry ^b,d  

^a Oxnard Operations   (United States)

^b Lumonics Inc   (Canada)

^c Oxnard Lumonics/Oxnard Corp O   (United States)

^d YALE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MARKING MACHINES; NEODYMIUM LASERS; SEMICONDUCTOR DEVICE MANUFACTURE;

LASER MARKING;

SILICON WAFERS;

EID: 0031173531     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (5)

1. C.J. Nonhof, Material Processing with Nd-Laser, Electrochemical Publications, p. 244, 1988.
2. S.M. Sze, Physics of Semiconductor Devices, Wley and Sons, NY, pp. 53-55, 1969.
3. T.J. McKee, Physics in Canada., pp. 107-114, March/April 1995.
4. J. Boneberg, O. Yavas, B. Merswa, P. Leiderer, Proceedings, SPIF (Society of Photonics & Instrumentation Engineers), 1991.
5. J.J. Ewing, Laser Focus World, pp. 105-110, Nov. 1993.