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Volumn 190, Issue 1, 1997, Pages 212-223

The effect of the ionic strength on the adsorption isotherms of nickel on silica

Author keywords

Electric double layer; Mixed solvent; Nickel; Silicon (IV) oxide; SMDO; Specific adsorption; Surface complexation; Surface heterogeneity; Triple layer model

Indexed keywords

DIMETHYL SULFOXIDE; NICKEL; SILICON; SOLVENT;

EID: 0031171129     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1006/jcis.1997.4840     Document Type: Article
Times cited : (25)

References (25)
  • 7
    • 0011071833 scopus 로고
    • Ph.D. Thesis, Stanford University, Stanford, CA, quoted after (8)
    • 7. Benjamin, M. M., Ph.D. Thesis, Stanford University, Stanford, CA, 1978, quoted after (8).
    • (1978)
    • Benjamin, M.M.1
  • 17
    • 0002350349 scopus 로고
    • [in Polish]
    • 17. Kosmulski, M., Wiad. Chem. 49, 21 (1995). [in Polish]
    • (1995) Wiad. Chem. , vol.49 , pp. 21
    • Kosmulski, M.1
  • 19
    • 85030303973 scopus 로고    scopus 로고
    • manuscript submitted for publication
    • 19. Kosmulski, M., manuscript submitted for publication.
    • Kosmulski, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.