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Volumn 36, Issue 6 A, 1997, Pages

Carrier density of epitaxial InN grown by plasma-assisted metalorganic chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHEMICAL BONDS; EPITAXIAL GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITROGEN; PLASMA APPLICATIONS; REACTION KINETICS; SAPPHIRE; SEMICONDUCTOR GROWTH; SURFACE TREATMENT;

EID: 0031170119     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l658     Document Type: Article
Times cited : (16)

References (10)
  • Reference 정보가 존재하지 않습니다.

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.