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Volumn 7, Issue 2 PART 3, 1997, Pages 3367-3370
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Technique for fabricating tungsten thin film sensors with tc ≤ 100 mk on germanium and silicon substrates
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINUM;
CRYOGENICS;
DEPOSITION;
GERMANIUM;
METALLIC FILMS;
PHONONS;
SENSORS;
SILICON;
SUBSTRATES;
TUNGSTEN;
TUNGSTEN SENSORS;
SUPERCONDUCTING FILMS;
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EID: 0031169779
PISSN: 10518223
EISSN: None
Source Type: Journal
DOI: 10.1109/77.622094 Document Type: Article |
Times cited : (6)
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References (7)
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