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Volumn 7, Issue 2 PART 3, 1997, Pages 3367-3370

Technique for fabricating tungsten thin film sensors with tc ≤ 100 mk on germanium and silicon substrates

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CRYOGENICS; DEPOSITION; GERMANIUM; METALLIC FILMS; PHONONS; SENSORS; SILICON; SUBSTRATES; TUNGSTEN;

EID: 0031169779     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.622094     Document Type: Article
Times cited : (6)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.