Stoichiometry and thickness variation of YBa2Cu3O7-x in pulsed laser deposition with a shadow mask

Applied Physics Letters

Volumn 70, Issue 25, 1997, Pages 3461-3463

  Trajanovic, Z ^a   Choopun, S ^a   Sharma, R P ^a   Venkatesan, T ^a  

^a Bldg 142   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGED PARTICLES; COMPOSITION EFFECTS; DEPOSITION; PULSED LASER APPLICATIONS; SILICON WAFERS; STOICHIOMETRY; YTTRIUM COMPOUNDS;

PULSED LASER DEPOSITION; THICKNESS DEPENDENCE;

SUPERCONDUCTING FILMS;

EID: 0031169131     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119201     Document Type: Article

References (7)

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