Electrodeposition of hard gold From acidic solution: The influence of substrates

Journal of the Electrochemical Society

Volumn 144, Issue 6, 1997, Pages 1979-1988

  Li, Y G ^a   Lasia, A ^a  

^a UNIVERSITÉ DE SHERBROOKE   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; COPPER; CRYSTAL GROWTH; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; NICKEL; NUCLEATION; PLATINUM; REACTION KINETICS; ROTATING DISKS; SUBSTRATES;

CHRONOAMPEROMETRY; GLASSY CARBON; LINEAR SWEEP VOLTAMMETRY (LSV);

GOLD;

EID: 0031168214     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837732     Document Type: Article

References (50)

1. F. R. Schlodder, H. H. Beyer, and W. G. Zilske, in GOLD 100. Vol. 3: Proceedings of the Symposium on the Industrial Uses of Gold, p. 21, SAIMM, Johannesburg (1986).
2. R. T. Page, Met. Finish. J., 20, 4 (1974).
3. J. Hendriks, in Connectors 91, G. D. Wilox and D. H. Ross, Editors, p. 20, Institute of Metal Finishing, Birmingham (1991).
4. S. J. Hemsley and R. V. Green, Trans. Inst. Met. Finish., 69, 149 (1991).
5. Y. Okinaka and C. Wolowodiuk, This Journal, 128, 288 (1981).
6. C. Booking, Trans. IMF, 66, 50 (1988).
7. C. Booking and B. Cameron, ibid., 72, 33 (1994).
8. H. G. Silver, This Journal, 116, 26C (1969).
9. D. M. MacArthur, ibid., 119, 672 (1972).
10. P. Bindra, D. Light, P. Freudenthal, and D. Smith, ibid., 136, 3616 (1989).
11. Dj. Davidovic and R. R. Adzic, Electrochim. Acta, 33, 103 (1988).
12. E. T. Eisenmann, This Journal, 125, 717 (1978).
13. H. Angerer and N. Ibl, J. Appl. Electrochem., 9, 219 (1979).
14. S. Nakahara, J. Cryst. Growth, 75, 212 (1986).
15. C. Booking and C. Dineen, Trans. IMF, 72, 101 (1994).
16. Y. Okinaka, in Electrodeposition Technology: Theory Practice, L. T. Romankiw and D. R. Turner, Editors, PV 87-17, p. 147, The Electrochemical Society Proceeding Series, Pennington, NJ (1987).
17. W. Chrzanowski, Y. G. Li, and A. Lasia, J. Appl. Electrochem., 26, 385 (1996).
18. Y. G. Li, W. Chrzanowski, and A. Lasia, ibid., 26, 843 (1996).
19. Y. G. Li and A. Lasia, ibid., 26, 853 (1996).
20. Y. G. Li and A. Lasia, ibid., In press.
21. E. Matulionis and A. Dziuve, Chemija, 178, 44 (1990).
22. S. T. Rao and R. Weil, Trans. Inst. Met. Finish., 57, 97 (1979).
23. G. Holmbom and B. E. Jacobson, This Journal, 135, 2720 (1988).
24. J. W. M. Jacobs and J. M. G. Rikken, ibid., 136, 3633 (1989).
25. J. A. Harrison and H. R. Thirsk, in Electroanalytical Chemistry, Vol. 5, A. J. Bard, Editor, p. 67, Marcel Dekker, New York (1971).
26. E. Bosco and S. K. Rangarajan, J. Electroanal. Chem., 134, 213 (1982).
27. R. D. Armstrong, M. Fleischmann, and H. R. Thirsk, ibid., 11, 208 (1966).
28. V. D. Jovic and J. N. Vicevic, Electrochim. Acta, 30, 1455 (1985).
29. M. Y. Abyaneh and M. Fleischmann, J. Electroanal. Chem., 119, 187, 197 (1981).
30. M. Avrami, J. Chem. Phys., 7, 1103 (1939); ibid., 8, 212 (1940); ibid., 9, 177 (1941).
31. M. Avrami, J. Chem. Phys., 7, 1103 (1939); ibid., 8, 212 (1940); ibid., 9, 177 (1941).
32. M. Avrami, J. Chem. Phys., 7, 1103 (1939); ibid., 8, 212 (1940); ibid., 9, 177 (1941).
33. M. Fleischmann and H. R. Thirsk, in Advances in Electrochemistry and Electrochemical Engineering, Vol. 3, P. Delahay, Editor, p.123, Wiley-Interscience, New York (1963).
34. A. Bewick, M. Fleischmann, and H. R. Thirsk, Trans. Faraday. Soc., 58, 2200 (1962).
35. H. Y. Cheh and R. Sard, This Journal, 118, 1737 (1971).
36. D. Pskus and G. Agafonovas, J. Electroanal. Chem., 395, 279 (1995).
37. I. R. Burrows, J. A. Harrison, and J. Thompson, ibid., 53, 283 (1974).
38. A. N. Moskvichev, G. A. Kurnoskin, V. N. Flerov, and Y. M. Tyurin, Izv. Vyssh. Uchebn. Zaved. Khim. Khim. Tekhnol., 26, 1458 (1983).
39. J. D. E. Mcintyre and W. F. Peck, Jr., This Journal, 123, 800 (1976).
40. J. Hofmann and D. W. Wabner, Metalloberfläche, 27, 1 (1973).
41. V. N. Fedorova and B. S. Krasikov, Zh. Prikl. Khim., 50, 792 (1977).
42. D. Pskus and G. Agafonovas, J. Electroanal. Chem., 393, 105 (1995).
43. H. Baltruschat and J. Heitbaum, ibid., 157, 319 (1983).
44. M. R. Mahoney and R. P. Cooney, J. Chem. Soc., Faraday Trans. I, 81, 2115 (1985).
45. P. Gao and M. J. Weaver, J. Phys. Chem., 93, 6205 (1989).
46. N. Rogozhnikov, Elektrokhimiya, 27, 683 (1980).
47. H. S. Dong and K. Kwan, Bull. Korean Chem. Soc., 15, 357 (1994).
48. M. Y. Abyaneh, Electrochim. Acta, 27, 1329 (1982).
49. M. Y. Abyaneh, ibid., 36, 727 (1991).
50. E. Bosco and S. K. Rangarajan, J. Electroanal. Chem., 134, 225 (1982).