Profiling shallow as implants with low-energy Cs bombardment on a modified cameca IMS-4f

Surface and Interface Analysis

Volumn 25, Issue 6, 1997, Pages 454-457

  Bennett, Joe ^a  

^a SEMATECH   (United States)

Author keywords

Cesium; Depth profile; Implant; SIMS

Indexed keywords

ARSENIC; CESIUM; ION BEAMS; ION BOMBARDMENT; SECONDARY ION MASS SPECTROMETRY;

DEPTH PROFILING;

ION IMPLANTATION;

EID: 0031168029     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199706)25:6<454::AID-SIA266>3.0.CO;2-N     Document Type: Article

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