Structure and properties of germanium carbide films prepared by RF reactive sputtering in Ar/GH4

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 6 A, 1997, Pages 3625-3628

  Liu, Z T ^a   Zhu, J Z ^a   Xu, N K ^a   Zheng, X L ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

Germanium carbide films; Optical properties; RF reactive sputtering

Indexed keywords

AMORPHOUS STRUCTURE; ATOMIC RATIO; GAS FLOW RATIO; GERMANIUM CARBIDE FILM; RADIO FREQUENCY REACTIVE SPUTTERING; VISIBLE NEAR INFRARED PHOTOMETER;

AUGER ELECTRON SPECTROSCOPY; CARBON; COMPOSITION; CRYSTAL STRUCTURE; HARDNESS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SPUTTERING; WEAR RESISTANCE; X RAY DIFFRACTION;

SEMICONDUCTING FILMS;

EID: 0031166490     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.3625     Document Type: Article

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