Study of stress in microwave plasma chemical vapor deposited diamond films using x-ray diffraction

Advanced Materials

Volumn 9, Issue 7, 1997, Pages 129-135

  Haque, M Shahidul ^a   Naseem, Hameed A ^a   Malshe, Ajay P ^a   Brown, William D ^a  

^a UNIVERSITY OF ARKANSAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; METHANE; MICROWAVES; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; RAMAN SCATTERING; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SILICON; X RAY CRYSTALLOGRAPHY;

MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; TENSILE STRESS;

DIAMOND FILMS;

EID: 0031166379     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (18)