Low density of states at the epitaxial CaF2-Si(111) interface

Journal of Physics D: Applied Physics

Volumn 30, Issue 12, 1997, Pages

  Dahne Prietsch M ^a   Manke, I ^a   Kalka, T ^a   Wen, H J ^b,c   Kaindl, G ^b  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

^b FREIE UNIVERSITÄT BERLIN   (Germany)

^c IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC DENSITY OF STATES; ENERGY GAP; EPITAXIAL GROWTH; FILM GROWTH; FLUORSPAR; PHOTOELECTRON SPECTROSCOPY; SEMICONDUCTING SILICON; THIN FILMS;

CALCIUM FLUORIDE; EPITAXIAL FILMS;

INTERFACES (MATERIALS);

EID: 0031165086     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/30/12/002     Document Type: Article

References (12)

1. Schowalter L J and Fathauer R W 1989 Crit. Rev. Solid State Mater Sci. 15 4
2. Suemasu T, Watanabe M, Suzuki J, Kohno Y, Asada M and Suzuki N 1994 Japan. J. Appl. Phys. 33 57
3. Ossicini S, Arcangeli C and Bisi O 1991 Phys. Rev. B 43 9823
4. Salehpour M R, Satpathy S and Das G P 1991 Phys. Rev. B 44 8880
5. Cho C-C, Kim T S, Gnade B E, Liu H Y and Nishioka Y 1992 Appl. Phys. Lett. 60 338
6. Cho C-C, Liu H Y, Gnade B E, Kim T S and Nishioka Y 1992 J. Vac. Sci. Technol. A 10 769
7. Wen H J, Dähne-Prietsch M, Bauer A, Kanke I and Kaindl G 1995 J. Vac. Sci. Technol. B 13 1645
8. Karlsson U O, Himpsel F J, Morar J F, McFeely F R, Rieger D and Yarmoff J A 1986 Phys. Rev. Lett. 57 1247
9. Rieger D, Himpsel F J, Karlsson U O, McFeely F R, Morar J F and Yarmoff J A 1986 Phys. Rev. B 34 7295
10. Weast R C (ed) 1977 CRC Handbook of Chemistry and Physics 58th edn (Cleveland, OH: Chemical Rubber Company)
11. Cuberes M T, Bauer A, Wen H J, Vandré D, Prietsch M and Kaindl G 1994 J. Vac. Sci. Technol. B 12 2422
12. Xu F, Vos M and Weaver JH 1989 Phys. Rev. B 39 8008