S-N-S weaklink junctions fabricated by nanometer lithography

IEEE Transactions on Applied Superconductivity

Volumn 7, Issue 2 PART 3, 1997, Pages 2635-2637

  Hirose, N ^a   Ohta, H ^b   Matsui, T ^b   Fukuda, M ^b  

^a Ministry of Posts and Telecommunication   (Japan)

^b TAKUSHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; GOLD; MAGNETRON SPUTTERING; NIOBIUM; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; SUPERCONDUCTING FILMS;

SUPERCONDUCTOR NORMAL METAL SUPERCONDUCTOR (SNS) JUNCTIONS;

JOSEPHSON JUNCTION DEVICES;

EID: 0031164969     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.621780     Document Type: Article

References (9)

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