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Volumn 7, Issue 2 PART 2, 1997, Pages 1642-1645

Surface morphology, microstructure and electrical properties of Y-Ba-Cu-O thin films

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); CRYSTAL MICROSTRUCTURE; FILM GROWTH; MAGNETRON SPUTTERING; MORPHOLOGY; NUCLEATION; OXIDE SUPERCONDUCTORS; SUPERCONDUCTING TRANSITION TEMPERATURE; SURFACE PROPERTIES;

EID: 0031163246     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.620892     Document Type: Article
Times cited : (13)

References (17)
  • 3
    • 36449004273 scopus 로고    scopus 로고
    • 7-x thin films grown by in situ of-axis sputtering, vol. 75(4), p.p. 2020-2025, February 1994.
    • 7-x thin films grown by in situ of-axis sputtering," J. Appl. Phys., vol. 75(4), p.p. 2020-2025, February 1994.
    • J. Appl. Phys.
    • Han, Z.1    Selinder, T.I.2    Helmersson, U.3
  • 4
    • 0026117622 scopus 로고    scopus 로고
    • J. Adrianse, A. W. Fortuin, H. I. De Groot, S. M.Verbrugh, G. Rietveld, et al., In situ growth of high tempera ture superconductor thin films with evaporation techniques using an ozone jet, vol. 27, p.p. 1013-1016, March 1991.
    • H. M. Appelboom, J. Adrianse, A. W. Fortuin, H. I. De Groot, S. M.Verbrugh, G. Rietveld, et al., "In situ growth of high tempera ture superconductor thin films with evaporation techniques using an ozone jet," IEEE Trans. Magn., vol. 27, p.p. 1013-1016, March 1991.
    • IEEE Trans. Magn.
    • Appelboom, H.M.1
  • 9
    • 33747812034 scopus 로고    scopus 로고
    • Department of Physics, Linköping University, s- 581 83 Linköping, Sweden, personal communication, 1996.
    • U. Helmersson, Department of Physics, Linköping University, s-581 83 Linköping, Sweden, personal communication, 1996.
    • Helmersson, U.1
  • 13
    • 0025416010 scopus 로고    scopus 로고
    • Effect of disharge gas pressure on YBaCuO epitaxial film formation by reactive rf magnetron sputtering, vol. 29(4), p.p. L611-L613, 1990.
    • K. Sakuta, M. Iyori, Y. Katayama, and T. Kobayashi, "Effect of disharge gas pressure on YBaCuO epitaxial film formation by reactive rf magnetron sputtering," Jpn. J. Appl. Phys., vol. 29(4), p.p. L611-L613, 1990.
    • Jpn. J. Appl. Phys.
    • Sakuta, K.1    Iyori, M.2    Katayama, Y.3    Kobayashi, T.4
  • 14
    • 0024639940 scopus 로고    scopus 로고
    • Film modification by low energy ion bombardment during deposition, vol. 171, p.p. 143-156, 1989.
    • S. M. Rossnagel and J. J. Cuomo, "Film modification by low energy ion bombardment during deposition," Thin Solid Films, vol. 171, p.p. 143-156, 1989.
    • Thin Solid Films
    • Rossnagel, S.M.1    Cuomo, J.J.2
  • 15
    • 5244373525 scopus 로고    scopus 로고
    • Silicon anodic-plasma oxidation during magnetron sputtering of yttria-stabilized zirconia, vol. 65(2), p.p. 156-158, 1994.
    • V. G. Beshenkov, V. A. Marchenko, and A. G. Znamenskii, "Silicon anodic-plasma oxidation during magnetron sputtering of yttria-stabilized zirconia," Appl. Phys. Lett., vol. 65(2), p.p. 156-158, 1994.
    • Appl. Phys. Lett.
    • Beshenkov, V.G.1    Marchenko, V.A.2    Znamenskii, A.G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.