-
1
-
-
0026123028
-
-
et al., Preparation of thin film high temperature superconductors, 27, p.p. 982-989, March 1991.
-
X. X. Xi, T. Venkatesan, Q. Li, X. D. Wu, A. Inam, C. C. Chang, et al., "Preparation of thin film high temperature superconductors," IEEE Trans. Magn., vol.27, p.p. 982-989, March 1991.
-
IEEE Trans. Magn., Vol.
-
-
Xi, X.X.1
Venkatesan, T.2
Li, Q.3
Wu D, X.4
Inam, A.5
Chang, C.C.6
-
2
-
-
0001590117
-
-
3 substrates, vol. 77(4), p.p. 1646-1653, 1995.
-
3 substrates," J. Appl. Phys., vol. 77(4), p.p. 1646-1653, 1995.
-
J. Appl. Phys.
-
-
Ece, M.1
Gonzales, E.G.2
Habermeier, H.U.3
-
3
-
-
36449004273
-
-
7-x thin films grown by in situ of-axis sputtering, vol. 75(4), p.p. 2020-2025, February 1994.
-
7-x thin films grown by in situ of-axis sputtering," J. Appl. Phys., vol. 75(4), p.p. 2020-2025, February 1994.
-
J. Appl. Phys.
-
-
Han, Z.1
Selinder, T.I.2
Helmersson, U.3
-
4
-
-
0026117622
-
-
J. Adrianse, A. W. Fortuin, H. I. De Groot, S. M.Verbrugh, G. Rietveld, et al., In situ growth of high tempera ture superconductor thin films with evaporation techniques using an ozone jet, vol. 27, p.p. 1013-1016, March 1991.
-
H. M. Appelboom, J. Adrianse, A. W. Fortuin, H. I. De Groot, S. M.Verbrugh, G. Rietveld, et al., "In situ growth of high tempera ture superconductor thin films with evaporation techniques using an ozone jet," IEEE Trans. Magn., vol. 27, p.p. 1013-1016, March 1991.
-
IEEE Trans. Magn.
-
-
Appelboom, H.M.1
-
5
-
-
36449004780
-
-
7-x layers prepared by metalorganic chemical vapor deposition, vol. 74(7), p.p. 4631-4642, 1993.
-
7-x layers prepared by metalorganic chemical vapor deposition," J. Appl. Phys., vol. 74(7), p.p. 4631-4642, 1993.
-
J. Appl. Phys.
-
-
Hunder, J.1
Thomas, O.2
Mossang, E.3
Chandonet, P.4
Wiess, F.5
Boursier, D.6
-
6
-
-
0029326343
-
-
et al., YBaCuO thin films on sapphire up to 2-inch-diameter for microwave applications, vol. 5, p.p. 1797-1800, June 1995.
-
R. K. Belov, Y. N. Drozdov, S. V. Gaponov, S. A. Gusev, A. Y. Klimov, E. B. Kluenkov, et al., "YBaCuO thin films on sapphire up to 2-inch-diameter for microwave applications," IEEE Trans. Appl. Supercond., vol. 5, p.p. 1797-1800, June 1995.
-
IEEE Trans. Appl. Supercond.
-
-
Belov, R.K.1
Drozdov, Y.N.2
Gaponov, S.V.3
Gusev, S.A.4
Klimov, A.Y.5
Kluenkov, E.B.6
-
7
-
-
33747776351
-
-
et al., Microstructure and electrical propertis of YBCO films, vol. 6, p.p. 1-4, 1996.
-
Y. N. Drozdov, S. V. Gaponov, S. A. Gusev, E. B. Kluenkov, Y. N. Nozdrin, V. V. Talanov, et al., "Microstructure and electrical propertis of YBCO films," Supercond. Sci. Tecnol., vol. 6, p.p. 1-4, 1996.
-
Supercond. Sci. Tecnol.
-
-
Drozdov, Y.N.1
Gaponov, S.V.2
Gusev, S.A.3
Kluenkov, E.B.4
Nozdrin, Y.N.5
Talanov, V.V.6
-
9
-
-
33747812034
-
-
Department of Physics, Linköping University, s- 581 83 Linköping, Sweden, personal communication, 1996.
-
U. Helmersson, Department of Physics, Linköping University, s-581 83 Linköping, Sweden, personal communication, 1996.
-
-
-
Helmersson, U.1
-
12
-
-
36449000709
-
-
2O in the sputtering gas, vol. 77(12), p.p. 6388-6393, 1995.
-
2O in the sputtering gas," J. Appl. Phys., vol. 77(12), p.p. 6388-6393, 1995.
-
J. Appl. Phys.
-
-
Johnson, C.N.L.1
Helmersson, U.2
Madsen, L.D.3
Runder, S.4
Wernlund, L.-D.5
-
13
-
-
0025416010
-
-
Effect of disharge gas pressure on YBaCuO epitaxial film formation by reactive rf magnetron sputtering, vol. 29(4), p.p. L611-L613, 1990.
-
K. Sakuta, M. Iyori, Y. Katayama, and T. Kobayashi, "Effect of disharge gas pressure on YBaCuO epitaxial film formation by reactive rf magnetron sputtering," Jpn. J. Appl. Phys., vol. 29(4), p.p. L611-L613, 1990.
-
Jpn. J. Appl. Phys.
-
-
Sakuta, K.1
Iyori, M.2
Katayama, Y.3
Kobayashi, T.4
-
14
-
-
0024639940
-
-
Film modification by low energy ion bombardment during deposition, vol. 171, p.p. 143-156, 1989.
-
S. M. Rossnagel and J. J. Cuomo, "Film modification by low energy ion bombardment during deposition," Thin Solid Films, vol. 171, p.p. 143-156, 1989.
-
Thin Solid Films
-
-
Rossnagel, S.M.1
Cuomo, J.J.2
-
15
-
-
5244373525
-
-
Silicon anodic-plasma oxidation during magnetron sputtering of yttria-stabilized zirconia, vol. 65(2), p.p. 156-158, 1994.
-
V. G. Beshenkov, V. A. Marchenko, and A. G. Znamenskii, "Silicon anodic-plasma oxidation during magnetron sputtering of yttria-stabilized zirconia," Appl. Phys. Lett., vol. 65(2), p.p. 156-158, 1994.
-
Appl. Phys. Lett.
-
-
Beshenkov, V.G.1
Marchenko, V.A.2
Znamenskii, A.G.3
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