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Applied Surface Science

Volumn 115, Issue 2, 1997, Pages 149-156

Hydrogen substitution of alcohol adsorbents on a Si surface by B 2 H 6 deduced from molecular orbital calculation

(2) Izawa, M a Fujisaki, Y a

a HITACHI LTD (Japan)

Author keywords

Ab initio calculations; Alcohols; Diborane; Semiconductor devices fabrication; Silicon; Surface cleaning

Indexed keywords

ACTIVATION ENERGY; ADSORPTION; ALCOHOLS; BORON; DESORPTION; HYDROGEN; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SUBSTITUTION REACTIONS; SURFACE TREATMENT;

MOLECULAR ORBITAL METHOD;

SURFACE CLEANING;

EID: 0031162530 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(97)80198-5 Document Type: Article

Times cited : (1)

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