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Volumn 52, Issue 7, 1997, Pages 813-821
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Ion beam sputtering techniques for high-resolution concentration depth profiling with glancing-incidence X-ray fluorescence spectrometry
a,b a a a a a |
Author keywords
Depth profiling; Ion beam sputtering; Surface analysis; Thin layer; X ray fluorescence
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Indexed keywords
ETCHING;
FLUORESCENCE;
ION BEAMS;
SPUTTER DEPOSITION;
SUBSTRATES;
GLANCING INCIDENCE X RAY FLUORESCENCE SPECTROMETRY (GIXRF);
HIGH RESOLUTION CONCENTRATION DEPTH PROFILING;
ION BEAM SPUTTERING;
SURFACE ANALYSIS;
X RAY SPECTROSCOPY;
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EID: 0031162524
PISSN: 05848547
EISSN: None
Source Type: Journal
DOI: 10.1016/S0584-8547(96)01643-6 Document Type: Article |
Times cited : (9)
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References (21)
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