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Volumn 52, Issue 7, 1997, Pages 813-821

Ion beam sputtering techniques for high-resolution concentration depth profiling with glancing-incidence X-ray fluorescence spectrometry

Author keywords

Depth profiling; Ion beam sputtering; Surface analysis; Thin layer; X ray fluorescence

Indexed keywords

ETCHING; FLUORESCENCE; ION BEAMS; SPUTTER DEPOSITION; SUBSTRATES;

EID: 0031162524     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0584-8547(96)01643-6     Document Type: Article
Times cited : (9)

References (21)
  • 15
    • 0001874777 scopus 로고
    • J.L. Vossen and W. Kern (Eds.), Academic Press, New York, Chapter 2
    • J.L. Vossen, J.J. Cuomo, in: J.L. Vossen and W. Kern (Eds.), Thin Film Processes, Academic Press, New York, 1978, Chapter 2.
    • (1978) Thin Film Processes
    • Vossen, J.L.1    Cuomo, J.J.2
  • 20
    • 0000154593 scopus 로고
    • Reprint of IUPAC document
    • Reprint of IUPAC document, Spectrochim. Acta, 33 (1978) 241.
    • (1978) Spectrochim. Acta , vol.33 , pp. 241
  • 21
    • 0347872256 scopus 로고
    • Oberflächen- und Materialtechnologie GmbH (OMT), Lübeck
    • Contract Analysis, Oberflächen- und Materialtechnologie GmbH (OMT), Lübeck, 1994.
    • (1994) Contract Analysis


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.