Formation of Si(111)-6×6-Au structure without using a vacuum evaporation technique observed by reflection high-energy electron diffraction

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 6, 1997, Pages

  Takami, Tomohide ^a   Ino, Shozo ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EVAPORATION; GOLD; MICELLES; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICON WAFERS; VACUUM APPLICATIONS;

MULTIPLY TWINNED PARTICLE (MTP) MICELLES; VACUUM EVAPORATION TECHNIQUE;

SEMICONDUCTOR DEVICE STRUCTURES;

EID: 0031153561     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l815     Document Type: Article

References (22)