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Thin Solid Films

Volumn 301, Issue 1-2, 1997, Pages 1-6

Room temperature reduction of MERIE-like plasma-induced interface states

(1) Atanassova, E a

a INSTITUTE OF SOLID STATE PHYSICS (Bulgaria)

Author keywords

Interfaces; Metal oxide semiconductors; Plasma processing and deposition

Indexed keywords

ANNEALING; CAPACITORS; CRYSTAL DEFECTS; INTERFACES (MATERIALS); PLASMA ETCHING; REACTIVE ION ETCHING;

MAGNETICALLY ENHANCED REACTIVE ION ETCHING; MOS CAPACITORS;

MOS DEVICES;

EID: 0031153332 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(96)09596-X Document Type: Article

Times cited : (1)

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