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Volumn 49, Issue 1, 1997, Pages 42-45

Study of electron trapping in the amorphous tantalum oxide thin films prepared by d.c. magnetron reactive sputtering

Author keywords

C V measurement; Electron trapping; Tantalum oxide thin films

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; ELECTRIC CONDUCTIVITY OF SOLIDS; MAGNETRON SPUTTERING; MOS DEVICES; OXIDES;

ELECTRON TRAPPING; TANTALUM OXIDE;

TANTALUM COMPOUNDS;

EID: 0031153255 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/S0254-0584(97)80125-3 Document Type: Article

Times cited : (10)

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