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Volumn 178, Issue 1-2, 1997, Pages 134-146

Supersonic jet epitaxy of III-nitride semiconductors

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; EPITAXIAL GROWTH; FILM GROWTH; NITRIDES; PLASMA JETS; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING FILMS; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING INDIUM COMPOUNDS; SUPERSONIC FLOW; NITROGEN;

EID: 0031150302     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(97)00080-8     Document Type: Article
Times cited : (19)

References (103)
  • 8
    • 0030036912 scopus 로고    scopus 로고
    • G. Fasol, Science 272 (1996) 1751.
    • (1996) Science , vol.272 , pp. 1751
    • Fasol, G.1
  • 25
    • 0003158036 scopus 로고
    • Ed. G. Scoles Oxford University Press, New York
    • D.R. Miller, in: Atomic and Molecular Beam Methods, Vol. 2, Ed. G. Scoles (Oxford University Press, New York, 1988) p. 14.
    • (1988) Atomic and Molecular Beam Methods , vol.2 , pp. 14
    • Miller, D.R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.