Photoresist Shipley® 1350-J with crystal violet® tint for holographic optical elements

Optical Materials

Volumn 7, Issue 4, 1997, Pages 189-195

  Luna Moreno, D ^a   Olivares Perez A ^a   Berriel Valdos, L R ^a  

^a INSTITUTO NACIONAL DE ASTROFÍSICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; DIFFRACTION GRATINGS; DYES; HELIUM NEON LASERS; LIGHT ABSORPTION; PHOTORESISTS;

CRYSTAL VIOLET TINT;

HOLOGRAPHIC OPTICAL ELEMENTS;

EID: 0031146967     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-3467(97)00005-0     Document Type: Article

References (9)

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4. S. Austin and F.T. Stone, Appl. Opt. 15 (1976) 1071.
5. M.T. Gale, M. Rossi, J. Pedersen and H. Schutz, Opt. Eng. 33 (1994) 3556.
6. T.R. Jay and M.B. Stern, Opt. Eng. 33 (1994) 3552.
7. A. Olivares-P., D. Malacara, C.E. Solano, and J.P. Isaksen, Appl. Opt. 33 (1994) 2043.
8. Merck Index, 8th ed. (Rahway, NJ, 1968).
9. W.H. Press, B.P. Flannery, S.A. Teukolsky and W.T. Vetterling, Numerical Recipes in Pascal (Cambridge University Press, New York, 1990) ch. 3, p. 87.